Antimony trisulfide ($Sb_{2}S_{3}$), as an emerging material for integrated
photonic devices, has attracted significant attention due to its high index,
low loss, and phase-changing property in the optical regime. However,
conventional lithography-based fabrication methods involve complex,
time-consuming, multistep processes, rendering the photonic application of
$Sb_{2}S_{3}$ challenging. Here, we demonstrate that positive-tone fabrication
of $Sb_{2}S_{3}$ nanostructures using wet-etch femtosecond laser processing, a
straightforward technique for the engraving of micro- and nanoscale structures,
can address major fabrication challenges. The patterning mechanism and factors
influencing resolution of $Sb_{2}S_{3}$ thin film structures deposited on
quartz (transmissive) and gold (reflective) substrates are experimentally
investigated and supported by theoretical modelling. Using this approach, the
smallest linewidth fabricated is measured at 178 nm. Consequently, multiple
test patterns are demonstrated showing versatile functionalities. Functional
Fresnel Zone Plates (FZPs) with varying focal length are fabricated and
characterized. This study provides a significantly simplified approach for
realizing $Sb_{2}S_{3}$ based integrated photonic devices.

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